AVS 66th International Symposium and Exhibition

AVS 66th International Symposium and Exhibition


Columbus, Ohio, USA 


PHI USAから発表、ブースを出展(#500)いたします。

Monday, Oct. 21, 10:40 AM, AS
- "Misinterpretations in the Spectroscopic Analysis of Heterogeneous Materials and Defected Structures", 
L. Swartz

Tuesday, Oct. 22, 2:00 PM, Exhibitor Talks
- "What’s New at PHI", 
J. Newman

Tuesday, Oct. 22, 5:00 PM, AS
- "Characterization of Electronic Materials using Low Energy Inverse Photoemission Spectroscopy", 
B. Schmidt

Thursday, Oct. 24, 8:40 AM, AS
- "TOF-SIMS Tandem MS Imaging of (Sub-)Monolayer Coatings for Device Processing", 

Thursday, Oct. 24, 12:00 PM, AS
- "Multi-technique Surface Analysis of Graphenes", 
K. Artyushkova

Thursday Poster Session
- "Using AES, EDS, and FIB to Detect, Identify, and Image Buried Metallic Particles"
A. Ellsworth

Thursday Poster Session
- "XPS, TOF-SIMS, and AES Analysis of Fresh and Aged Alumina-Supported Silver Catalysts", 
J. Newman