{"id":781,"date":"2014-08-15T12:53:00","date_gmt":"2014-08-15T03:53:00","guid":{"rendered":"https:\/\/www.ulvac-phi.com\/surface-analysis\/topics\/gcib\/"},"modified":"2026-07-13T14:15:55","modified_gmt":"2026-07-13T05:15:55","slug":"gcib","status":"publish","type":"topics","link":"https:\/\/www.ulvac-phi.com\/en\/surface-analysis\/topics\/gcib\/","title":{"rendered":"About Gas Cluster Ion Beam"},"content":{"rendered":"\n

What is the Gas Cluster Ion Beam<\/h2>\n\n

Gas Cluster Ion Beam (GCIB) technology\u00b9\u207e is a Japanese-originated advanced technology developed at Kyoto University. GCIB is an ion beam formed from several thousand gas atoms (molecules) such as argon, achieving ion beam etching with extremely low energy per atom \u2014 something that could not be achieved with conventional ion beam technology \u2014 as well as surface planarization after etching\u00b2\u207e.<\/p>\n

\n
\"\"
Fig. 1\u3000Comparison of characteristics between conventional ion beam and cluster ion beam\u00b3\u207e<\/figcaption><\/figure>\n<\/div>\n

<\/p>\n

\n
\"\"
Fig. 2\u3000Overview of the gas cluster ion beam instrument\u00b3\u207e<\/figcaption><\/figure>\n<\/div>\n

Cluster ions have long been used in surface analysis techniques such as XPS<\/a> and TOF-SIMS<\/a>\u2077\u207e. Among cluster ions, C60<\/sub> ions in particular are capable of surface cleaning and low-damage sputter etching for many polymers and organic materials, and have been incorporated into numerous commercial analytical instruments, with several tens of units now in practical use for surface analysis worldwide. Ar gas cluster ion beams show almost no chemical changes derived from the irradiated ions on the etched surface, achieving ultra-low energy ion etching at approximately 1 to 20 eV per atom \u2014 something that cannot be achieved with C60<\/sub> \u2014 enabling low-damage, high-depth-resolution etching.<\/p>\n\n

Figure 3 shows the exterior of the released instrument. The compact GCIB instrument for surface analysis was jointly developed by ULVAC, Inc. and ULVAC-PHI, Inc.\u00b3\u207b\u2076\u207e<\/p>\n

\n
\"\"
Fig. 3\u3000Compact gas cluster ion gun for surface analysis<\/figcaption><\/figure>\n<\/div>\n

<\/p>\n\n

\n

References<\/h2>\n\n\n\n
    \n
  1. \u5c71\u7530\u3000\u516c(\u7de8)\uff1a\u300e\u30af\u30e9\u30b9\u30bf\u30fc\u30a4\u30aa\u30f3\u30d3\u30fc\u30e0\u3000\u57fa\u790e\u3068\u5fdc\u7528\u300f\u3001\u65e5\u520a\u5de5\u696d\u65b0\u805e\u793e(2006).<\/a><\/li>\n\n\n\n
  2. \u677e\u5c3e\u4e8c\u90ce\u3001\u702c\u6728\u5229\u592b\u3001\u9752\u6728\u5b66\u8061\uff1a\u8868\u9762\u79d1\u5b66\u300131<\/strong> [11] 564 (2010).<\/li>\n\n\n\n
  3. \u30a2\u30eb\u30d0\u30c3\u30af\u30fb\u30d5\u30a1\u30a4\u682a\u5f0f\u4f1a\u793e\u3001\u682a\u5f0f\u4f1a\u793e\u30a2\u30eb\u30d0\u30c3\u30af\uff1a\u65b0\u805e\u767a\u8868(2008\u5e7412\u670824\u65e5).<\/li>\n\n\n\n
  4. \u56fd\u90e8\u5229\u5bff\uff1a\u30a2\u30eb\u30d0\u30c3\u30af\u30c6\u30af\u30cb\u30ab\u30eb\u30b8\u30e3\u30fc\u30ca\u30eb\u300159<\/strong>, 1(2003).<\/li>\n\n\n\n
  5. \u56fd\u90e8\u5229\u5bff\uff1a\u30a2\u30eb\u30d0\u30c3\u30af\u30c6\u30af\u30cb\u30ab\u30eb\u30b8\u30e3\u30fc\u30ca\u30eb\u300164<\/strong>, 1(2006).<\/li>\n\n\n\n
  6. \u9593\u5bae\u4e00\u654f\uff1a\u30a2\u30eb\u30d0\u30c3\u30af\u30c6\u30af\u30cb\u30ab\u30eb\u30b8\u30e3\u30fc\u30ca\u30eb\u300171<\/strong>, 1(2009).<\/li>\n\n\n\n
  7. \u771e\u7530\u5247\u660e\uff1aJ. Surf. Anal., 14<\/strong> [3], 204(2008).<\/a><\/li>\n<\/ol>\n<\/div>\n\n

    <\/p>\n\n

    \n

    Related Information Links<\/h2>\n\n\n\n

    Shipment of surface analysis instruments equipped with gas cluster ion gun (GCIB) began in November 2010<\/a><\/p>\n<\/div>\n","protected":false},"featured_media":777,"template":"","topics-tag":[],"class_list":["post-781","topics","type-topics","status-publish","has-post-thumbnail","hentry"],"acf":[],"aioseo_notices":[],"aioseo_head":"\n\t\t\n\t\n\t\n\t\n\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t\n\t\t